Micro and Nano Engineering (MNE 2023) is one of the most important international conferences dedicated to micro- and nano-fabrication industry focusing on manufacturing techniques, as well as applications of the fabricated micro/nanostructures, devices, and microsystems into electronics, photonics, energy, environment, chemistry and life sciences.
Oxford Instruments Plasma Technology team is looking forward to welcoming you to Berlin to discuss your current projects and
workflows. If you would like to book a meeting with us during the
event, please complete the form below.
During MNE 2023 our team will give talks on the below subjects.
Location
Berlin, Germany
Date
25-28 September 2023
Booth Number
Oxford Instruments Booth
Business
Plasma Technology
Dr Sarah Riazimehr
Tuesday, 26 September 2023 at 3:45 pm - 4:00 pm
(Track1 - Novel Developments in Nano/Micro Fabrication Methods and Processes, Venue - MOA12)
Talk Title: Damage-free Plasma-assisted Atomic Layer Deposition of High-quality Dielectrics on 2D Materials
In this work, we developed a process to deposit dielectrics on graphene through an in-situ-prepared protective layer, using the Oxford Instruments AtomfabTM plasma ALD system.
Dr Sarah Riazimehr is a researcher in residence hired by Oxford Instruments and based at AMO GmbH. She runs Oxford Instruments activities within the 2D Experimental Pilot Line (2DEPL) project. Her main goal is to develop processes to deposit dielectric on 2D materials using Oxford Instruments Atomfab plasma ALD system without inducing any damage on the 2D materials.
Arjun Moothedath
Tuesday, 26 September 2023 at 4:15 pm - 6:30 pm
(Poster Session1.1: Focus Track/Track1/Track3, Venue - MOA10/11)
Talk Title: Nonlinear parameter-evolution approach for achieving high aspect ratio in nanoscale etching
Silicon-based periodic nanoscale structures can confine light in compact space, allowing for a high density of integrated optical components through band gap (effective refractive index) engineering. The critical dimension and profile of these high aspect ratio structures are essential to optical performance. This paper reports a nonlinear parameter evaluation with an exponential function for the nanoscale etching.
Arjun Moothedath is an Application Engineer (Etch) at Oxford Instruments Plasma Technology, UK. With a background in Electronics and Communication Engineering, he specializes in silicon-based process development. Currently, his main focus is on developing the Bosch silicon etching process using the PlasmaPro 100 Estrelas Deep Reactive Ion Etch (DRIE) tools.
Visit MNE 2023 Program
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